Electron beam lithographic techniques and electrochemical reactions for the micro- and nanostructuring of surfaces under extreme conditions

Journal of Electroceramics

Volumn 16, Issue 1, 2006, Pages 9-14

  Djenizian, T ^a   Schmuki, P ^a  

^a UNIVERSITY OF ERLANGEN NUREMBERG   (Germany)

Author keywords

Electrochemical reactions; Electron beam lithography; Electron beam induced deposition; Extreme conditions; Nanopatterning

Indexed keywords

ELECTROCHEMISTRY; ELECTROPLATING; ETCHING; NANOSTRUCTURED MATERIALS; SUBSTRATES;

ELECTROCHEMICAL REACTIONS; ELECTRON-BEAM-INDUCED DEPOSITION; EXTREME CONDITIONS; NANOPATTERNING;

ELECTRON BEAM LITHOGRAPHY;

EID: 33646416456     PISSN: 13853449     EISSN: 15738663     Source Type: Journal    
DOI: 10.1007/s10832-006-0902-1     Document Type: Article

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