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Volumn 892, Issue , 2006, Pages 77-82

Properties of InN grown by high-pressure CVD

Author keywords

[No Author keywords available]

Indexed keywords

CHEMICAL VAPOR DEPOSITION; HETEROJUNCTIONS; RAMAN SCATTERING; SEMICONDUCTOR GROWTH; SOLAR CELLS; SOLID STATE LASERS;

EID: 33646403436     PISSN: 02729172     EISSN: None     Source Type: Conference Proceeding    
DOI: None     Document Type: Conference Paper
Times cited : (3)

References (18)
  • 9
    • 85136013717 scopus 로고    scopus 로고
    • Indium-nitride growth by HPCVD: Real-time and ex-situ characterization
    • N. Dietz, book chapter 6 ed. Z.C. Feng, Imperial College Press (ICP)
    • "Indium-nitride growth by HPCVD: Real-time and ex-situ characterization," N. Dietz, book chapter 6 in "III-Nitrides Semiconductor Materials", ed. Z.C. Feng, Imperial College Press (ICP) pp. 203-235 (2005).
    • (2005) III-nitrides Semiconductor Materials , pp. 203-235


* 이 정보는 Elsevier사의 SCOPUS DB에서 KISTI가 분석하여 추출한 것입니다.