Surface modification of single crystal silicon by Ar+ ion implantation and vacuum deposition of amorphous carbon coating

Surface and Coatings Technology

Volumn 200, Issue 20-21, 2006, Pages 5794-5799

  Sun, Rong ^a,b,c   Xu, Tao ^a   Xue, Qun ji ^a  

^a INSTITUTE OF GEOLOGY AND GEOPHYSICS   (China)

^b HENAN UNIVERSITY   (China)

^c UNIVERSITY OF CHINESE ACADEMY OF SCIENCES   (China)

Author keywords

Adhesion; Amorphous carbon coating; Ion implantation; Microstructure; Silicon; Tribology

Indexed keywords

ADHESION; AMORPHOUS MATERIALS; ARGON; CARBON; CRYSTAL MICROSTRUCTURE; FRICTION; ION IMPLANTATION; SINGLE CRYSTALS; SURFACE TREATMENT; TRIBOLOGY; VACUUM DEPOSITED COATINGS; WEAR OF MATERIALS;

AMORPHOUS CARBON COATING; NANO-INDENTATION DEVICE; VACUUM VAPOR DEPOSITION;

SILICON WAFERS;

ADHESION; AMORPHOUS MATERIALS; ARGON; CARBON; CRYSTAL MICROSTRUCTURE; FRICTION; ION IMPLANTATION; SILICON WAFERS; SINGLE CRYSTALS; SURFACE TREATMENT; TRIBOLOGY; VACUUM DEPOSITED COATINGS; WEAR OF MATERIALS;

EID: 33645770747     PISSN: 02578972     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.surfcoat.2005.08.125     Document Type: Article

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