Nanoparticle fabrication for micro total analysis system by using ion implantation and surface etching

Surface and Coatings Technology

Volumn 187, Issue 2-3, 2004, Pages 167-171

  Nakano, Shizuka ^a   Ishizuka, Masanori ^b   Wang, Qing ^a,c   Ogiso, Hisato ^a  

^a NATIONAL INSTITUTE OF ADVANCED INDUSTRIAL SCIENCE AND TECHNOLOGY AIST   (Japan)

^b WASEDA UNIVERSITY   (Japan)

^c UNIVERSITY OF ELECTRO COMMUNICATIONS   (Japan)

Author keywords

Chemical etching; Gold; Ion implantation; Nanostructure; SEM; Silicon

Indexed keywords

ADHESION; CATALYSTS; ETCHING; GOLD; NANOSTRUCTURED MATERIALS; SURFACE TREATMENT; THERMAL EFFECTS;

IMPLANTATION TEMPERATURE; MICROSCALE REGIONS; SURFACE ETCHING;

ION IMPLANTATION;

ETCHING;

EID: 4644367274     PISSN: 02578972     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.surfcoat.2004.05.027     Document Type: Article

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