Properties of hydrogenated amorphous carbon thin films deposited by plasma-based ion implantation method

Diamond and Related Materials

Volumn 13, Issue 4-8, 2004, Pages 1449-1453

  Ishihara, M ^a   Suzuki, M ^a   Watanabe, T ^b   Tsuda, O ^a   Nakamura, T ^a   Tanaka, A ^a   Koga, Y ^a  

^a NATIONAL INSTITUTE OF ADVANCED INDUSTRIAL SCIENCE AND TECHNOLOGY AIST   (Japan)

^b MITSUBISHI HEAVY INDUSTRIES LTD   (Japan)

Author keywords

Amorphous hydrogenated carbon; Diamond like carbon; Implantation; Tribology

Indexed keywords

ELECTRIC POTENTIAL; ELECTRON CYCLOTRON RESONANCE; ION IMPLANTATION; STAINLESS STEEL; THIN FILMS;

CARBON MIXING LAYER; CARBON SOURCE; HIGH-VOLTAGE PULSES; PLASMA BASED CYCLOTRON RESONANCE (ECR);

DIAMONDS;

CARBON; DIAMOND-LIKE CARBON; FILM; FILM THICKNESS; HYDROGENATION; TRIBOLOGY;

EID: 2442610628     PISSN: 09259635     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.diamond.2003.12.022     Document Type: Article

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