Removal of moisture contamination from porous polymeric low-k dielectric films

AIChE Journal

Volumn 52, Issue 4, 2006, Pages 1586-1593

  Iqbal, Asad ^a   Juneja, Harpreet ^a   Yao, Junpin ^a   Shadman, Farhang ^a  

^a UNIVERSITY OF ARIZONA   (United States)

Author keywords

Desorption; Dielectrics; Methylsilsesquioxane (MSQ); Moisture; Outgassing

Indexed keywords

METHYLSILSESQUIOXANE; METHYLSILSESQUIOXANE (MSQ); MICROELECTRONIC DEVICES; POROUS FILMS;

CONCENTRATION (PROCESS); DESORPTION; DIELECTRIC FILMS; IMPURITIES; MASS SPECTROMETRY; MICROELECTRONICS; MOISTURE; SEMICONDUCTING POLYMERS; SILICA;

DEGASSING;

CONCENTRATION (PROCESS); DEGASSING; DESORPTION; DIELECTRIC FILMS; IMPURITIES; MASS SPECTROMETRY; MICROELECTRONICS; MOISTURE; SEMICONDUCTING POLYMERS; SILICA;

EID: 33645686160     PISSN: 00011541     EISSN: 15475905     Source Type: Journal    
DOI: 10.1002/aic.10760     Document Type: Article

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