Analysis of surface contamination on organosilicate low k dielectric materials

Microelectronic Engineering

Volumn 77, Issue 1, 2005, Pages 63-70

  Lu, D ^a   Kumar, R ^a   Chang, C K ^a   Du, A Y ^a   Wong, T K S ^b  

^a INSTITUTE OF MICROELECTRONICS   (Singapore)

^b NANYANG TECHNOLOGICAL UNIVERSITY   (Singapore)

Author keywords

Low dielectrics; Photoresist poisoning; Surface contamination; ToF SIMS

Indexed keywords

CONTAMINATION; COPPER; PERMITTIVITY; PHOTORESISTS; SECONDARY ION MASS SPECTROMETRY; SILICATES; SILICON WAFERS; SURFACE TREATMENT; VLSI CIRCUITS;

ORGANOSILICATES; PHOTORESIST POISONING; SURFACE CONTAMINATION; TOF-SIMS; WAFER PATTERNING;

DIELECTRIC MATERIALS;

EID: 9644291749     PISSN: 01679317     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.mee.2004.08.006     Document Type: Article

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