Electrical and physical analysis of MoTa alloy for gate electrode applications

Journal of the Electrochemical Society

Volumn 153, Issue 5, 2006, Pages

  Chen, Bei ^a   Biswas, Nivedita ^a   Misra, Veena ^a  

^a North Carolina State University   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

CMOS INTEGRATED CIRCUITS; ELECTROCHEMICAL ELECTRODES; GATES (TRANSISTOR); RUTHERFORD BACKSCATTERING SPECTROSCOPY; SOLID SOLUTIONS; X RAY DIFFRACTION;

EFFECTIVE WORK FUNCTION; METAL DIFFUSION; MO-TA COMPOUND;

MOLYBDENUM ALLOYS;

EID: 33645673937     PISSN: 00134651     EISSN: None     Source Type: Journal    
DOI: 10.1149/1.2180710     Document Type: Article

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