Modification of Ta/polymeric low-k interface by electron-beam treatment

Journal of the Electrochemical Society

Volumn 153, Issue 1, 2006, Pages

  Gan, Zhenghao ^a   Mhaisalkar, S G ^a   Chen, Zhong ^a   Chen, Zhe ^b   Prasad, K ^b   Zhang, Sam ^c   Damayanti, M ^a   Jiang, N ^d  

^a NANYANG TECHNOLOGICAL UNIVERSITY   (Singapore)

^b NANYANG TECHNOLOGICAL UNIVERSITY   (Singapore)

^c NANYANG TECHNOLOGICAL UNIVERSITY   (Singapore)

^d INSTITUTE OF MICROELECTRONICS   (Singapore)

Author keywords

[No Author keywords available]

Indexed keywords

CAPACITANCE; COPPER; DIELECTRIC MATERIALS; PERMITTIVITY; POLYMERS; POROUS MATERIALS;

ADHESION ENERGY; ELECTRON-BEAM TREATMENT; POROUS POLYARYLENE ETHERS;

ELECTRON BEAMS;

EID: 33645505564     PISSN: 00134651     EISSN: None     Source Type: Journal    
DOI: 10.1149/1.2129493     Document Type: Article

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