Measuring the role of surface chemistry in silicon microphotonics

Applied Physics Letters

Volumn 88, Issue 13, 2006, Pages

  Borselli, Matthew ^a   Johnson, Thomas J ^a   Painter, Oskar ^a  

^a California Institute of Technology   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

CHEMICAL OXIDE SURFACES; MICROPHOTONICS COMPONENTS; NANOPHOTONIC SYSTEMS; OPTICAL LOSS; STANDARD MICROELECTRONIC TREATMENTS;

HYDROGEN; OPTICAL PROPERTIES; OPTICAL RESONATORS; SURFACE CHEMISTRY;

SILICON;

EID: 33645499840     PISSN: 00036951     EISSN: None     Source Type: Journal    
DOI: 10.1063/1.2191475     Document Type: Article

References (26)

1. D. A. Muller, Nat. Mater. 4, 645 (2005).
2. A. Liu, R. Jones, L. Liao, D. Samara-Rubio, D. Rubin, O. Cohen, R. Nicolaescu, and M. Paniccia, Nature (London) 427, 615 (2004).
3. Q. Xu, B. Schmidt, S. Pradhan, and M. Lipson, Nature (London) 435, 325 (2005).
4. O. Boyraz and B. Jalali, Opt. Express 12, 5269 (2004).
5. H. Rong, R. Jones, A. Liu, O. Cohen, D. Hak, A. Fang, and M. Paniccia, Nature (London) 433, 725 (2005).
6. T. Tanabe, M. Notomi, S. Mitsugi, A. Shinya, and E. Kuramochi, Opt. Lett. 30, 2575 (2005).
7. B. Song, S. Noda, T. Asano, and Y. Akahane, Nat. Mater. 4, 207 (2005).
8. D. V. Lang, J. Appl. Phys. 45, 3023 (1974).
9. J. Linnros, J. Appl. Phys. 84, 284 (1998).
10. A. Chantre, G. Vincent, and D. Bois, Phys. Rev. B 23, 5335 (1981).
11. I. M. P. Aarts, B. Hoex, A. H. M. Smets, R. Engeln, W. M. M. Kessels, and M. C. M. van de Sanden, Appl. Phys. Lett. 84, 3079 (2004).
12. W. B. Jackson and N. M. Amer, Phys. Rev. B 25, 5559 (1982).
13. G. Amato and F. Fizzotti, Phys. Rev. B 45, 14108 (1992).
14. P. Blood, IEEE J. Quantum Electron. 36, 354 (2000).
15. S. M. Spillane, T. J. Kippenberg, K. J. Vahala, K. W. Goh, E. Wilcut, and H. J. Kimble, Phys. Rev. A 71, 013817 (2005).
16. M. Borselli, T. J. Johnson, and O. Painter, Opt. Express 13, 1515 (2005).
17. M. Borselli, K. Srinivasan, P. E. Barclay, and O. Painter, Appl. Phys. Lett. 85, 3693 (2004).
18. M. Gorodetsky, A. Pryamikov, and V. Ilchenko, J. Opt. Soc. Am. B 17, 1051 (2000).
19. B. E. Little, J.-P. Laine, and S. T. Chu, Opt. Lett. 22, 4 (1997).
20. D. Fenner, D. Biegelsen, and R. Bringans, J. Appl. Phys. 66, 419 (1989).
21. Y. Chabal, G. Higashi, and K. Raghavachari, J. Vac. Sci. Technol. A 7, 2104 (1989).
22. D. K. Sparacin, S. J. Spector, and L. C. Kimerling, J. Lightwave Technol. 23, 2455 (2005).
23. S. Petitdidier, V. Bertagna, N. Rochat, D. Rouchon, P. Besson, R. Erre, and M. Chemla, Thin Solid Films 476, 51 (2005).
24. H. Kobayashi, Y. Yamashita, Y. Nakato, T. Komeda, and Y. Nishioka, Appl. Phys. Lett. 69, 2276 (1996).
25. M. Borselli, T. J. Johnson, and O. Painter (unpublished).
26. Y. Yamashita, K. Namba, Y. Nakato, Y. Nishioka, and H. Kobayashi, J. Appl. Phys. 79, 7051 (1996).