SCOPUS 정보 검색 플랫폼

Journal of Physics and Chemistry of Solids

Volumn 67, Issue 4, 2006, Pages 665-668

Investigations of structure and morphology of the AlN nano-pillar crystal films prepared by halide chemical vapor deposition under atmospheric pressure

(3) Takahashi, Naoyuki a Matsumoto, Yoriko a Nakamura, Takato a

a SHIZUOKA UNIVERSITY (Japan)

Author keywords

[No Author keywords available]

Indexed keywords

ALUMINUM NITRIDE; ATMOSPHERIC PRESSURE; CHEMICAL VAPOR DEPOSITION; CRYSTAL STRUCTURE; MORPHOLOGY; SCANNING ELECTRON MICROSCOPY;

GROWTH TEMPERATURE; HEXAGONAL PILLAR STRUCTURES; ROTATION ANGLE; TRANSMISSION ELECTRON DIFFRACTION;

THIN FILMS;

EID: 33645064051 PISSN: 00223697 EISSN: None Source Type: Journal
DOI: 10.1016/j.jpcs.2005.10.179 Document Type: Article

Times cited : (17)

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