Field emission characteristics of oriented-AlN thin film on tungsten tip

Applied Surface Science

Volumn 251, Issue 1-4, 2005, Pages 215-219

  Yue, S L ^a   Gu, C Z ^a   Shi, C Y ^a   Zhi, C Y ^b  

^a INSTITUTE OF PHYSICS   (China)

^b INSTITUTE OF GEOLOGY AND GEOPHYSICS   (China)

Author keywords

Aluminum nitride; Field emission; Orientation

Indexed keywords

ALUMINUM NITRIDE; ELECTRIC INSULATORS; FIELD EMISSION CATHODES; HYSTERESIS; MAGNETRON SPUTTERING; TUNGSTEN COMPOUNDS;

CURRENT-ELECTRIC FIELDS; FIELD EMISSION; ORIENTATION; RADIO FREQUENCY MAGNETRON REACTIVE SPUTTERING;

THIN FILMS;

EID: 27544481809     PISSN: 01694332     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.apsusc.2005.03.105     Document Type: Conference Paper

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