New vapor phase growth method of FeN thin films using a chloride source

Japanese Journal of Applied Physics, Part 1: Regular Papers and Short Notes and Review Papers

Volumn 38, Issue 10, 1999, Pages 6031-6033

  Takahashi, Naoyuki ^a   Toda, Yoshihiro ^a   Nakamura, Takato ^b   Fujii, Toshitaka ^b  

^a SHIZUOKA UNIVERSITY   (Japan)

^b TOYOHASHI UNIVERSITY OF TECHNOLOGY   (Japan)

Author keywords

[No Author keywords available]

Indexed keywords

AMMONIA; ATMOSPHERIC PRESSURE; COERCIVE FORCE; GLASS; IRON COMPOUNDS; MAGNETIZATION; SUBSTRATES; THIN FILMS; VAPOR PHASE EPITAXY; X RAY DIFFRACTION ANALYSIS;

IRON NITRIDE; X RAY DIFFRACTOGRAM;

SEMICONDUCTING FILMS;

EID: 0033356764     PISSN: 00214922     EISSN: None     Source Type: Journal    
DOI: 10.1143/jjap.38.6031     Document Type: Article

References (12)

1. T. K. Kim and M. Takahashi: Appl. Phys. Lett. 20 (1972) 492.
2. M. Komuro, Y. Kozono, M. Hanazono and Y. Sugita: J. Appl. Phys. 67 (1990)5126.
3. A.Kano.N.S.KazamaandH.Fujimori: J. Appl. Phys. 53 (1982) 8332.
4. T. Tanaka, A. Kodama, M. Takahashi, T. Yakiyama, S. lizuka, R. Hatakcyama and N. Salo: 14th Conf. Mag. Soc. Jpn. (1990) llaC-10 [in Japanese].
5. H. Miyamoto, T. Niihara, H. Sukcda, M. Takahashi, T. Nakao, M. Ojima and N. Olua: J. Appl. Phys. 66 (1989) 6138.
6. N. Takahashi, J. Ogasawara and A. Koukilu: J. Cryst. Growth 172 (1997)298.
7. N. Takahashi, R. Matsumoto, A. Koukitu and H. Scki: Jpn. J. Appl. Phys.36(1997)L601.
8. N. Takahashi, R. Matsumoto, A. Koukitu and H. Scki: Jpn. J. Appl. Phys. 36 (1997) L743.
9. N. Takahashi, S. Matsuki, A. Koukitu and H. Seki: Jpn. J. Appl. Phys. 36 (1997) Ll 133.
10. N. Takahashi, R. Matsumoto, A. Koukitu and H. Seki; J. Cryst. Growth 189/190(1998)37.
11. S. Matar, B. Siberchicot, M. Pcnicaud and G. Demazeau: J. Phys. I (Paris) 2 (1992) 1819.
12. M. Robbins and J. G. White: J. Phys. Cheni. Solids 25 (1964) 717.