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Journal of Materials Chemistry

Volumn 10, Issue 12, 2000, Pages 2835-2837

Atmospheric pressure chemical vapor deposition of tin nitride thin films using a halide source

(3) Takahashi, N a Terada, K a Nakamura, T a

a SHIZUOKA UNIVERSITY (Japan)

Author keywords

[No Author keywords available]

Indexed keywords

AMMONIA; ELECTROLYTE; HALIDE; NITROGEN DERIVATIVE; SODIUM SULFATE; STANNOUS CHLORIDE; TIN;

ARTICLE; ATMOSPHERIC PRESSURE; CHEMICAL STRUCTURE; ELECTRIC POTENTIAL; ELECTRIC RESISTANCE; FILM; MICROANALYSIS; VAPOR;

EID: 0034532460 PISSN: 09599428 EISSN: None Source Type: Journal
DOI: 10.1039/b005032f Document Type: Article

Times cited : (20)

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* 이 정보는 Elsevier사의 SCOPUS DB에서 KISTI가 분석하여 추출한 것입니다.