Short-wavelength ablation of molecular solids: Pulse duration and wavelength effects

Journal of Microlithography, Microfabrication and Microsystems

Volumn 4, Issue 3, 2005, Pages

  Juha, Libor ^a   Bittner, Michal ^a   Chvostová, Dagmar ^a   Krása, Josef ^a   Kozlová, Michaela ^a   Pfeifer, Miroslav ^a   Polan, Jiri ^a   Präg, Ansgar R ^a   Rus, Bedrich ^a   Stupka, Michal ^a   Feldhaus, Josef ^b   Létal, Vit ^c   Otcenasek, Zdenek ^c   Krzywinski, Jacek ^d   Nietubyc, Robert ^d   Pelka, Jerzy B ^d   Andrejczuk, Andrzej ^e   Sobierajski, Ryszard ^f   Ryc, Leszek ^g   Boody, Frederick P ^h   Fiedorowicz, Henryk ⁱ   Bartnik, Andrzej ⁱ   Mikolajczyk, Janusz ⁱ   Rakowski, Rafal ⁱ   Kubát, Pavel ^j   Pína, Ladislav ^k   Horváth, Martin ^k   Grisham, Michael E ^l   Vaschenko, Georgiy O ^l   Menoni, Carmen S ^l   Rocca, Jorge J ^l   more..

^a INSTITUTE OF PHYSICS   (Czech Republic)

^b DESY   (Germany)

^c CZECH TECHNICAL UNIVERSITY IN PRAGUE   (Czech Republic)

^d INSTITUTE OF PHYSICS   (Poland)

^e UNIVERSITY OF BIALYSTOK   (Poland)

^f WARSAW UNIVERSITY OF TECHNOLOGY   (Poland)

^g SOLTAN INSTITUTE FOR NUCLEAR STUDIES   (Poland)

^h Ion Light Technologies GmbH   (Germany)

ⁱ MILITARY UNIVERSITY OF TECHNOLOGY   (Poland)

^j J HEYROVSKÝ INSTITUTE OF PHYSICAL CHEMISTRY   (Czech Republic)

^k Reflex sro   (Czech Republic)

^l Engineering Research Center and Hydraulics Laboratory   (United States)

more..

Author keywords

Extreme ultraviolet; Laser materials modification; Laserinduced damage; Polymers; X ray lasers

Indexed keywords

EXTREME ULTRAVIOLET; LASER MATERIALS MODIFICATION; X-RAY LASERS;

ATTENUATION; ETCHING; LASER DAMAGE; RADIATION EFFECTS; ULTRAVIOLET RADIATION;

LASER ABLATION;

EID: 33644815496     PISSN: 15371646     EISSN: None     Source Type: Journal    
DOI: 10.1117/1.2037467     Document Type: Article

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