Annealing studies of TiN films deposited by plasma-assisted CVD

Surface and Coatings Technology

Volumn 138, Issue 2-3, 2001, Pages 237-241

  Cheng, Zhao ^a   Peng, Hong Rui ^a   Xie, Guang Wen ^a   Shi, Yu Long ^a  

^a QINGDAO UNIVERSITY OF SCIENCE AND TECHNOLOGY   (China)

Author keywords

Annealing treatment; Plasma assisted CVD; TiN film

Indexed keywords

ANNEALING; COMPOSITION; ENERGY DISPERSIVE SPECTROSCOPY; LATTICE CONSTANTS; MICROHARDNESS; MICROSTRUCTURE; PLASMA ENHANCED CHEMICAL VAPOR DEPOSITION; SCANNING ELECTRON MICROSCOPY; THERMAL EFFECTS; TITANIUM NITRIDE; X RAY DIFFRACTION ANALYSIS; X RAY PHOTOELECTRON SPECTROSCOPY;

HIGH SPEED STEEL;

METALLIC FILMS;

ANNEALING; PLASMA TREATMENT; TITANIUM NITRIDE; VAPOR DEPOSITION; WEAR RESISTANCE;

EID: 0035897250     PISSN: 02578972     EISSN: None     Source Type: Journal    
DOI: 10.1016/S0257-8972(00)01138-5     Document Type: Article

References (11)