An international round-robin experiment to evaluate the consistency of nanoindentation hardness measurements of thin films

Surface and Coatings Technology

Volumn 168, Issue 1, 2003, Pages 57-61

  Lee, Kitty W ^a   Chung, Yip Wah ^a   Chan, C Y ^b   Bello, I ^b   Lee, S T ^b   Karimi, Ayatollah ^c   Patscheider, Joerg ^d   Delplancke Ogletree, M P ^e   Yang, Dehua ^f   Boyce, Brad ^g   Buchheit, Thomas ^g  

^a Northwestern University   (United States)

^b CITY UNIVERSITY OF HONG KONG   (Hong Kong)

^c EPFL   (Switzerland)

^d SWISS FEDERAL LABORATORIES FOR MATERIALS SCIENCE AND TECHNOLOGY   (Switzerland)

^e UNIVERSITÉ LIBRE DE BRUXELLES   (Belgium)

^f Bruker Corporation   (United States)

^g SANDIA NATIONAL LABORATORIES   (United States)

Author keywords

Magnetron sputtering; Nanoindentation hardness; Round robin experiment

Indexed keywords

HARDNESS; INDENTATION; MAGNETRON SPUTTERING; MULTILAYERS; NANOSTRUCTURED MATERIALS; STATISTICAL METHODS;

THERMAL DRIFT;

THIN FILMS;

CALIBRATION; FILM; FILM THICKNESS; HARDNESS; MEASUREMENT METHOD; SPUTTERING;

EID: 0037404010     PISSN: 02578972     EISSN: None     Source Type: Journal    
DOI: 10.1016/S0257-8972(02)00889-7     Document Type: Article

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