Strippable aqueous base developable negative photoresist for high aspect ratio micromachining

Microelectronic Engineering

Volumn 61-62, Issue , 2002, Pages 729-735

  Chatzichristidi, Margarita ^a   Raptis, Ioannis ^a   Diakoumakos, Constantinos D ^a   Glezos, Nikos ^a   Argitis, Panagiotis ^a   Sanopoulou, Merope ^b  

^a INSTITUTE OF MICROELECTRONICS   (Greece)

^b Institute of Physical Chemistry   (Greece)

Author keywords

Aqueous base developable resist; Epoxy resin; Micromachining; Poly(4 hydroxystyrene); UV LIGA

Indexed keywords

NEGATIVE PHOTORESISTS; PATTERN TRANSFER PROCESSES;

ASPECT RATIO; CROSSLINKING; EPOXY RESINS; HYDROGENATION; MICROELECTRONICS; MICROMACHINING; OLIGOMERS; SEMICONDUCTING FILMS; SOLUBILITY;

PHOTORESISTS;

EID: 0036643843     PISSN: 01679317     EISSN: None     Source Type: Journal    
DOI: 10.1016/S0167-9317(02)00481-1     Document Type: Article

References (9)