Mask cleaning strategies - Particle elimination with minimal surface damage

Proceedings of SPIE - The International Society for Optical Engineering

Volumn 5992, Issue 2, 2005, Pages

  Osborne, Steve ^a   Nanninga, Matthias ^b   Takahashi, Hidekazu ^a   Woster, Eric ^a   Kanda, Carl ^a   Tibbe, John ^b  

^a Sigmameltec Ltd   (Japan)

^b Advanced Mask Technology Center   (Germany)

Author keywords

[No Author keywords available]

Indexed keywords

CLEANING; LIGHT TRANSMISSION; MOLYBDENUM COMPOUNDS; PHASE SHIFT; QUARTZ; SURFACE PHENOMENA;

MASK CLEANING STRATEGIES; MOLYBDENUM SILICIDE; PARTICLE ELIMINATION; SURFACE DAMAGE;

MASKS;

EID: 33644600907     PISSN: 0277786X     EISSN: None     Source Type: Conference Proceeding    
DOI: 10.1117/12.632151     Document Type: Conference Paper

References (9)

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