Immersion System Process Optimization for 248nm and 193nm Photomasks - Binary and EAPSM

Proceedings of SPIE - The International Society for Optical Engineering

Volumn 5256, Issue 1, 2003, Pages 518-525

  Chen, Gim ^a   Reyes, Julio ^b   Wood, James ^b   Kashkoush, Ismail ^a   Dieu, Laurent ^b   Novak, Richard ^a  

^a Akrion   (United States)

^b DuPont Photomasks Inc   (United States)

Author keywords

Binary photomask; EAPSM (embedded attenuated phase shift mask); Ozone chemistry; Phase angle; Photomask cleaning; Photoresist stripping; Reflectivity; Transmittance

Indexed keywords

ANTIREFLECTION COATINGS; ATTENUATION; ETCHING; OPTIMIZATION; OZONE; PHASE SHIFT; PHOTORESISTS;

OZONE CHEMISTRY; PHASE ANGLE; PHOTOMASK CLEANING;

MASKS;

EID: 1842422576     PISSN: 0277786X     EISSN: None     Source Type: Conference Proceeding    
DOI: 10.1117/12.518247     Document Type: Conference Paper

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