Process optimization for particle removal on blank chrome mask plates in preparation for resist application

Proceedings of SPIE - The International Society for Optical Engineering

Volumn 4562 II, Issue , 2001, Pages 652-663

  Osborne, S ^a   Smith, E ^b   Woster, E ^b   Pelayo, A ^b  

^a Etec Systems   (United States)

^b Metron International   (United States)

Author keywords

Mask plate cleaning; Megasonic; Spin cleaning

Indexed keywords

COATING TECHNIQUES; OPTIMIZATION; PHOTOIONIZATION; PHOTORESISTS; SURFACE ACTIVE AGENTS; ULTRAVIOLET RADIATION;

CHROME MASKS;

MASKS;

EID: 0035763618     PISSN: 0277786X     EISSN: None     Source Type: Journal    
DOI: 10.1117/12.458347     Document Type: Article

References (5)

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2. D.M. Considine, Ed., Van Nostrand's Encyclopedia, Fifth Edition, "Cavitation" and "Fluid Flow", Van Nostrand Reinhold Company, New York, 1976.
3. A.A. Busnaina, I.I. Kashkoush, G.W. Gale, "An Experimental Study of Megasonic Cleaning of Silicon Wafers", J. Electrochem. Soc., Vol. 142, No. 8, pp. 2812-2817, 1995.
4. T. Ohmi, M. Toda, K. Kawada and H. Morita, "Megasonic Irradiation Induced Chemical Reaction in the Solution for Silicon Wafer Cleaning", Mat Res Soc Symp Proc., Vol. 477, pp. 3-32, 1997.
5. M. Itano and T. Kezuka, T. Hattori (Ed.); Ultraclean Surface Processing of Silicon Wafers, Springer, New York, Ch. 10, pp. 123-126, 1995.