The Study on Characteristics and Control of Haze Contamination induced by Photochemical Reaction

Proceedings of SPIE - The International Society for Optical Engineering

Volumn 5130, Issue , 2003, Pages 563-567

  Han, Sung Jae ^a   Yu, Sang Yong ^a   Sung, Moon Gyu ^a   Kim, Yong Hoon ^a   Yoon, Hee Sun ^a   Sohn, Jung Min ^a  

^a SAMSUNG Electronics   (South Korea)

Author keywords

Cleaning; Haze; Photocontamination; Photomask

Indexed keywords

AMMONIA; AUGER ELECTRON SPECTROSCOPY; CARBON; CONTAMINATION; LIGHT SOURCES; MASKS; PHASE SHIFT; PHOTOCHEMICAL REACTIONS; SCANNING ELECTRON MICROSCOPY; SULFUR; SURFACE CLEANING;

HAZE; PHOTOCONTAMINATIONS; PHOTOMASKS;

PHOTOLITHOGRAPHY;

EID: 1642555686     PISSN: 0277786X     EISSN: None     Source Type: Conference Proceeding    
DOI: 10.1117/12.504277     Document Type: Conference Paper

References (3)

1. R.R.Kunz, Experimentation and modeling of Organic Photocontamination on Lithographic Optics, Optical Microlithography VIII, Proceedings of SPIE, Vol. 4000, 474-487, 2000
2. Devon A. Kinkead, Preventing Next Generation Photochemical Contamination of Lithographic Optics, Micromagazine, October, 2001
3. John Mulkens, Christian Wagner, Challenges and Opportunities for 157 nm Mask technology