The development of refined cleaning technique focusing on ecological viewpoint

Proceedings of SPIE - The International Society for Optical Engineering

Volumn 4409, Issue 1, 2001, Pages 418-429

  Tange, Koji ^a   Nagamura, Yoshikazu ^a   Hosono, Kunihiro ^a   Oomasa, Yuki ^b   Kido, Koichi ^b   Hayashi, Atsushi ^b   Kikuchi, Yasutaka ^b   Imagawa, Ichiro ^b   Matsuzawa, Yuuich ^b   Usui, Hozumi ^c  

^a MITSUBISHI ELECTRIC CORPORATION   (Japan)

^b TOPPAN PRINTING CO LTD   (Japan)

^c Wacom Electric Co Ltd   (Japan)

Author keywords

[No Author keywords available]

Indexed keywords

DEGRADATION; HYDROGEN PEROXIDE; OPTICAL PROPERTIES; SEMICONDUCTING ORGANIC COMPOUNDS; SUBSTITUTION REACTIONS; SULFURIC ACID;

HIGH EFFICIENCY OZONIZING APPARATUS; OPTICAL DEGRADATION;

SEMICONDUCTOR DEVICE MANUFACTURE;

EID: 17944379535     PISSN: 0277786X     EISSN: None     Source Type: Journal    
DOI: 10.1117/12.438375     Document Type: Article

References (2)