ArF half-tone PSM cleaning process optimization for next-generation lithography

Proceedings of SPIE - The International Society for Optical Engineering

Volumn 4066, Issue , 2000, Pages 416-423

  Son, Yong Seok ^a   Jeong, Seong Ho ^a   Kim, Jeong Bae ^a   Kim, Hong Seok ^a  

^a DUPONT COMPANY   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

ARGON; CHEMICAL CLEANING; CONTAMINATION; INTEGRATED CIRCUIT LAYOUT; PARTICLES (PARTICULATE MATTER); PHOTOLITHOGRAPHY;

HALF TONE PHASE SHIFT MASK; PELLICLIZATION; PHASE AND TRANSMITTANCE; PHASE ANGLE; PHOTOMASK;

MASKS;

EID: 0033674795     PISSN: 0277786X     EISSN: None     Source Type: Conference Proceeding    
DOI: 10.1117/12.392044     Document Type: Conference Paper

References (3)