UV Light with Oxygen treatment of Phase shift photoblank for Phase and Transmission control. Applicable to MxSi(1-x)O yN(y-1) type

Proceedings of SPIE - The International Society for Optical Engineering

Volumn 5130, Issue , 2003, Pages 51-57

  Chovino, Christian ^a   Dieu, Laurent ^a  

^a DuPont Photomasks Inc   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

AMMONIA; CLEANING; ETCHING; HYDROGEN PEROXIDE; INTAKE SYSTEMS; MOLYBDENUM COMPOUNDS; MONITORING; OXYGEN; PHASE SHIFT; TRANSPARENCY; ULTRAVIOLET RADIATION; X RAY PHOTOELECTRON SPECTROSCOPY;

ACCEPTANCE ANGLE; PHASE SHIFT MASKS (PSM);

PHASE CONTROL;

EID: 1642514830     PISSN: 0277786X     EISSN: None     Source Type: Conference Proceeding    
DOI: 10.1117/12.504048     Document Type: Conference Paper

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