Effect of external magnetic field on c-axis orientation and residual stress in AlN films

Thin Solid Films

Volumn 332, Issue 1-2, 1998, Pages 247-251

  Kusaka, Kazuya ^a   Ao, Takahiro ^a   Hanabusa, Takao ^a   Tominaga, Kikuo ^a  

^a UNIVERSITY OF TOKUSHIMA   (Japan)

Author keywords

AFM observation; AlN film; Residual stress; Sputtering; X ray diffraction

Indexed keywords

ALUMINUM COMPOUNDS; ATOMIC FORCE MICROSCOPY; BOROSILICATE GLASS; CRYSTAL ORIENTATION; FILM PREPARATION; GRAIN SIZE AND SHAPE; MAGNETIC FIELD EFFECTS; MAGNETRON SPUTTERING; RESIDUAL STRESSES; STRESS ANALYSIS; THERMAL EXPANSION; X RAY CRYSTALLOGRAPHY;

ION PEENING;

MAGNETIC THIN FILMS;

EID: 0032476369     PISSN: 00406090     EISSN: None     Source Type: Journal    
DOI: 10.1016/S0040-6090(98)01095-5     Document Type: Article

References (14)

1. T. Shiosaki, T. Yamamoto, T. Oda, A. Kawabata, Appl. Phys. Lett. 36 (1980) 643.
2. M.T. Wauk, D.K. Winslow, Appl. Phys. Lett. 13 (8) (1968) 286.
3. A.J. Schuskus, T.M. Reeder, E.L. Paradis, Appl. Phys. Lett. 24 (4) (1974) 155.
4. Y. Murayama, K. Kashiwagi, M. Kikuchi, J. Vac. Sci. Technol. 17 (4) (1980) 796.
5. J.A. Thornton, D.W. Hoffman, J. Vac. Sci. Technol. 14 (1) (1977) 164.
6. J.A. Thornton, D.W. Hoffman, J. Vac. Sci. Technol. A 3 (1985) 576.
7. G. Este, W.D. Westwood, J. Vac. Sci. Technol. A 5 (4) (1987) 1982.
8. G. Kleer, R. Kassner, E.-M. Meyer, M.G. Schinker, W. Doell, Surf. Coat. Technol. 54/55 (1992) 167.
9. W.M. Yim, R.J. Paff, J. Appl. Phys. 45 (3) (1974) 1456.
10. E. Macherauch, P. Muller, Z. Angew. Phys. 13 (1961) 305.
11. T. Hanabusa, K. Tominaga, H. Fujiwara, J. Soc. Mater. Sci. Jpn. 42 (472) (1993) 90.
12. K. Tsubouchi, N. Mikoshiba, Proc. 1983 IEEE Ultrasonic Symp., 1983, p. 299.
13. K. Tominaga, T. Ao, Y. Sato, K. Kusaka, T. Hanabusa, Vacuum, submitted.
14. B.D. Cullity, Elements of X-ray Diffraction, Addison-Wesley, Reading, MA, 1956.