Impacts of uniaxial compressive strain on dynamic negative bias temperature instability of p-channel MOSFETs

Electrochemical and Solid-State Letters

Volumn 9, Issue 4, 2006, Pages

  Lu, Chia Yu ^a   Lin, Horng Chih ^a   Huang, Tiao Yuan ^a  

^a NATIONAL CHIAO TUNG UNIVERSITY   (Taiwan)

Author keywords

[No Author keywords available]

Indexed keywords

SEMICONDUCTING SILICON; STRAIN;

DYNAMIC NEGATIVE BIAS TEMPERATURE INSTABILITY (DNBTI); SIN DEPOSITION; SIN-CAPPING LAYER;

MOSFET DEVICES;

EID: 33244478275     PISSN: 10990062     EISSN: None     Source Type: Journal    
DOI: 10.1149/1.2173189     Document Type: Article

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