GaAs/polymer optical nanowires: Fabrication and characterisation

Electronics Letters

Volumn 42, Issue 4, 2006, Pages 217-219

  Lauvernier, D ^a   Garidel, S ^a   Zegaoui, M ^a   Vilcot, J P ^a   Decoster, D ^a  

^a INSTITUT D ELECTRONIQUE   (France)

Author keywords

[No Author keywords available]

Indexed keywords

CHARACTERIZATION; FABRICATION; LIGHT POLARIZATION; LIGHT PROPAGATION; OPTICAL MATERIALS; SEMICONDUCTING GALLIUM ARSENIDE;

CROSS-SECTION; POLYMER MATRIX; PROPAGATION LOSS;

NANOSTRUCTURED MATERIALS;

EID: 32944478937     PISSN: 00135194     EISSN: None     Source Type: Journal    
DOI: 10.1049/el:20063869     Document Type: Article

References (8)

1. 2 waveguides by roughness reduction ', Opt. Lett., 2001, 26, (3), p. 1888-1890
2. Tsuchizawa, T.: et al. ' Microphotonics devices based on silicon microfabrication technology ', IEEE J. Sel. Top. Quantum Electron., 2005, 11, (1), p. 232-240
3. Dumon, P.: et al. ' Low-loss SOI photonic wires and ring resonators fabricated with deep UV lithography ', IEEE Photonics Technol. Lett., 2004, 16, (5), p. 1328-1330
4. Ma, Y.: et al. ' InGaAsP thin film microdisk resonators fabricated by polymer wafer bonding for wavelength add-drop filters ', IEEE Photonics Technol. Lett., 2000, 12, (11), p. 1495-1497
5. Lauvernier, D.: et al. ' Optimization of HSQ resist e-beam processing technique on GaAs material ', Microelectron. Eng., 2004, 75, (2), p. 177-182
6. Lauvernier, D.: et al. ' Realization of sub-micron patterns on GaAs using a HSQ etching mask ', Microelectron. Eng., 2005, 77, (2), p. 210-216
7. Lauvernier, D.: et al. ' Benzocyclobutene wafer bonding for III-V nanophotonic guiding structures ', Electron. Lett., 2005, 41, (21), p. 1170-1171
8. Dupont, S.: et al. ' Low-loss InGaAsP/InP submicron optical waveguides fabricated by ICP etching ', Electron. Lett., 2004, 40, (14), p. 865-866