Realization of sub-micron patterns on GaAs using a HSQ etching mask

Microelectronic Engineering

Volumn 77, Issue 3-4, 2005, Pages 210-216

  Lauvernier, Denis ^a   Garidel, Sophie ^a   Legrand, Christiane ^a   Vilcot, Jean Pierre ^a  

^a INSTITUT D ELECTRONIQUE   (France)

Author keywords

HSQ; III V semiconductors; Nano structures; SiCl4 Ar etching of GaAs

Indexed keywords

CROSSLINKING; ETCHING; OPTIMIZATION; PHOTONS; SILICONES; STOICHIOMETRY;

ETCHING MASK; HSQ RESIST; III/V SEMICONDUCTORS; SICCL4/AR ETCHING OF GAAS;

SEMICONDUCTING GALLIUM COMPOUNDS;

EID: 15344350685     PISSN: 01679317     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.mee.2004.11.002     Document Type: Article

References (15)

1. D. Lauvernier, J.-P. Vilcot, M. François, and D. Decoster Microelectron. Eng. 75 2 2004 177
2. F.C.M.J.M. Van Delft, J. Weterings, A.K. van Langen Suurling, and H. Romijn J. Vac. Sci. Technol. B 18 6 2000 3419
3. A.E. Dulkin, S.A. Moshkalyov, V.Z. Pyataev, A.S. Smirnov, and K.S. Frolov Microelectron. Eng. 17 1992 345
4. M.B. Stern, and P.F. Liao J. Vac. Sci. Technol. B 1 4 1983 1053
5. G.J. Sonek, L. Jian-Zhong, E.D. Wolf, and J.M. Ballantyne J. Lightwave. Technol. LT-3 5 1985 1147
6. J.Z. Li, I. Adesida, and E.D. Wolf J. Vac. Sci. Technol. B 3 1 1985 406
7. www.Dowcorning.com
8. Y.K Siew, G. Sarkar, X. Hu, J. Hui, A. See, and C.T. Chua J. Electrochem. Soc. 147 1 2000 335
9. W.-C. Liu J. Non-Cryst. Solids 311 2002 233
10. H.-C. Liou, and J. Pretzer Thin Solid Films 335 1998 186
11. P.T. Liu Thin Solid Films 332 1998 345
12. H. Namatsu J. Electrochem. Soc. 136 9 1989 2676
13. H. Namatsu J. Vac. Sci. Technol. B 16 1 1998 69
14. V.M. Donnelly, D.L. Flamm, and D.E. Ibbotson J. Vac. Sci. Technol. A 1 2 1983 626
15. J.W. Wu J. Electrochem. Soc. 142 4 1995 1340