Self-assembled monolayer growth on chemically modified polymer surfaces

Applied Surface Science

Volumn 252, Issue 10, 2006, Pages 3532-3540

  Pimanpang, S ^a   Wang, Pei I ^a   Wang, G C ^a   Lu, T M ^a  

^a Rensselaer Polytechnic Institute   (United States)

Author keywords

AFM; Contact angle; Plasma treatment; Self assembled monolayer; SiLK; XPS

Indexed keywords

AROMATIC HYDROCARBONS; ATOMIC FORCE MICROSCOPY; CONTACT ANGLE; PERMITTIVITY; PLASMA APPLICATIONS; SULFURIC ACID; SURFACE CHEMISTRY; X RAY PHOTOELECTRON SPECTROSCOPY;

PLASMA TREATMENT; SILK SURFACES; TETRASULFIDE SAM;

SELF ASSEMBLY;

EID: 32644489487     PISSN: 01694332     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.apsusc.2005.05.049     Document Type: Article

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