Creating nanostructures on silicon using ion blistering and electron beam lithography

Nanotechnology

Volumn 17, Issue 2, 2006, Pages 600-606

  Giguère, Alexandre ^a,c   Beerens, Jean ^b   Terreault, Bernard ^a  

^a INRS EMT   (Canada)

^b UNIVERSITÉ DE SHERBROOKE   (Canada)

^c UNIVERSITY OF NAMUR   (Belgium)

Author keywords

[No Author keywords available]

Indexed keywords

ELECTRON BEAM LITHOGRAPHY; MORPHOLOGY; SILICON; SPIN COATING; SWELLING;

ION BLISTERING; PATTERNING; THERMAL ANNEALING; TRENCHES;

NANOSTRUCTURED MATERIALS;

EID: 32644431665     PISSN: 09574484     EISSN: None     Source Type: Journal    
DOI: 10.1088/0957-4484/17/2/043     Document Type: Article

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