SCOPUS 정보 검색 플랫폼

Volumn 88, Issue 5, 2006, Pages 1-3

Carbon nanostructures on silicon substrates suitable for nanolithography

Author keywords

[No Author keywords available]

Indexed keywords

CHEMICAL VAPOR DEPOSITION; NANOTECHNOLOGY; SCANNING ELECTRON MICROSCOPY; SEMICONDUCTING SILICON; SEMICONDUCTOR GROWTH; THIN FILMS;

CARBON NANOSTRUCTURES; PLASMA ASHING; SILICON SUBSTRATES; TITANIUM-DIOXIDE FILM;

CARBON NANOTUBES;

EID: 31944452564 PISSN: 00036951 EISSN: None Source Type: Journal
DOI: 10.1063/1.2168039 Document Type: Article

Times cited : (26)

References (13)

1
- 79956035984
- J. Li, R. Stevens, L. Delzeit, A. Cassell, J. Hah, and M. Meyyappan, Appl. Phys. Lett. 81, 910 (2002).
- (2002) Appl. Phys. Lett. , vol.81 , pp. 910
- Li, J.¹ Stevens, R.² Delzeit, L.³ Cassell, A.⁴ Hah, J.⁵ Meyyappan, M.⁶

2
- 11744337476
- J. W. Mintmire and C. T. White, Phys. Rev. Lett. 81, 2506 (1998).
- (1998) Phys. Rev. Lett. , vol.81 , pp. 2506
- Mintmire, J.W.¹ White, C.T.²

3
- 0035848218
- M. Kociak, A. Kasumov, S. Gueron, B. Reulet, I. Khodos, B. Gorbatov, V. T Volkov, L. Vaccarini, and H. Bouchiat, Phys. Rev. Lett. 86, 2416 (2001).
- (2001) Phys. Rev. Lett. , vol.86 , pp. 2416
- Kociak, M.¹ Kasumov, A.² Gueron, S.³ Reulet, B.⁴ Khodos, I.⁵ Gorbatov, B.⁶ Volkov, V.T.⁷ Vaccarini, L.⁸ Bouchiat, H.⁹

4
- 31944440942
- S. Heinze, J. Tersoff, R. Martel, V. Derycke, J. Appenzeller, and Ph. Avouris, Phys. Rev. Lett. 89, 1 (2002).
- (2002) Phys. Rev. Lett. , vol.89 , pp. 1
- Heinze, S.¹ Tersoff, J.² Martel, R.³ Derycke, V.⁴ Appenzeller, J.⁵ Avouris, Ph.⁶

5
- 14744272771
- A. Javey, R. Tu, B. D Farmer, J. Guo, R. Gordon, and H. Dai, Nano Lett. 5, 345 (2005).
- (2005) Nano Lett. , vol.5 , pp. 345
- Javey, A.¹ Tu, R.² Farmer, B.D.³ Guo, J.⁴ Gordon, R.⁵ Dai, H.⁶

6
- 0036974829
- A. Javey, H. Kim, M. Brink, Q. Wang, A. Ural, J. Guo, P. Mcintyre, P. Mceuen, M. Lundstrom, and H. Dai, Nat. Mater. 1, 241 (2002).
- (2002) Nat. Mater. , vol.1 , pp. 241
- Javey, A.¹ Kim, H.² Brink, M.³ Wang, Q.⁴ Ural, A.⁵ Guo, J.⁶ McIntyre, P.⁷ McEuen, P.⁸ Lundstrom, M.⁹ Dai, H.¹⁰

7
- 0034864896
- Annu. Device Res. Conf. Digest
- P. McEuen, J. Park, A Bachtold, M. Woodside, M. Fuhrer, Annu. Device Res. Conf. Digest, 107 (2001).
- (2001) , pp. 107
- McEuen, P.¹ Park, J.² Bachtold, A.³ Woodside, M.⁴ Fuhrer, M.⁵

8
- 0036680337
- J.-M. Bonard, M. Croci, C. Klinke, F. Conus, I. Arfaoui, T. Stockli, and A. Chatelaine, Carbon, 40, 1715 (2002).
- (2002) Carbon , vol.40 , pp. 1715
- Bonard, J.-M.¹ Croci, M.² Klinke, C.³ Conus, F.⁴ Arfaoui, I.⁵ Stockli, T.⁶ Chatelaine, A.⁷

9
- 12144291632
- M. A. Guillorn, X. Yang, D. K Hensley, M. D Hale, V. I Merkulov, M. L Simpson, L. R Baylor, W. L. Gardner, and D. H. Lowndes, J. Vac. Sci. Technol. B 22, 35 (2004).
- (2004) J. Vac. Sci. Technol. B , vol.22 , pp. 35
- Guillorn, M.A.¹ Yang, X.² Hensley, D.K.³ Hale, M.D.⁴ Merkulov, V.I.⁵ Simpson, M.L.⁶ Baylor, L.R.⁷ Gardner, W.L.⁸ Lowndes, D.H.⁹

10
- 79955998904
- C. Nguyen, R. Stevens, J. Barber, J. Han, M. Sanchez, C. Larson, D. William, and M. Meyyappan, Appl. Phys. Lett. 81, 901 (2002).
- (2002) Appl. Phys. Lett. , vol.81 , pp. 901
- Nguyen, C.¹ Stevens, R.² Barber, J.³ Han, J.⁴ Sanchez, M.⁵ Larson, C.⁶ William, D.⁷ Meyyappan, M.⁸

11
- 0000662939
- H. Daia, N. Franklin, and J. Han, Appl. Phys. Lett. 73, 1508 (1998).
- (1998) Appl. Phys. Lett. , vol.73 , pp. 1508
- Daia, H.¹ Franklin, N.² Han, J.³

12
- 0037607842
- M. Meyyappan, L. Delziet, A. Cassell, and D. Hash, Plasma Sources Sci. Technol. 12, 205 (2003).
- (2003) Plasma Sources Sci. Technol. , vol.12 , pp. 205
- Meyyappan, M.¹ Delziet, L.² Cassell, A.³ Hash, D.⁴

13
- 2342568993
- B. Arvan, A. Khakifirooz, R. Tarighat, S. Mohajerzadeh, A. Goodarzi, E. A. Soleimani, and E. Arzi, Mater. Sci. Eng., B 109, 17 (2003).
- (2003) Mater. Sci. Eng., B , vol.109 , pp. 17
- Arvan, B.¹ Khakifirooz, A.² Tarighat, R.³ Mohajerzadeh, S.⁴ Goodarzi, A.⁵ Soleimani, E.A.⁶ Arzi, E.⁷

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