Detection of precursor molecules in the Metal Chloride Reduction CVD of Cu

Surface and Coatings Technology

Volumn 200, Issue 10 SPEC. ISS., 2006, Pages 3117-3121

  Hibi, Atsushi ^a   Tonegawa, Hiroshi ^b   Tonokura, Kenichi ^a   Satake, Kouji ^b   Sakamoto, Hitoshi ^b   Koshi, Mitsuo ^a  

^a UNIVERSITY OF TOKYO   (Japan)

^b MITSUBISHI HEAVY INDUSTRIES LTD   (Japan)

Author keywords

Copper CVD; CuCl; Electron impact ionization mass spectrometry; Laser Induced Fluorescence; Metal Chloride Reduction CVD

Indexed keywords

COPPER COMPOUNDS; ETCHING; MASS SPECTROMETRY; MOLECULAR STRUCTURE; REACTION KINETICS; THIN FILMS;

COPPER CHEMICAL VAPOR DEPOSITION (CVD); COPPER CHLORIDE; ELECTRON IMPACT IONIZATION MASS SPECTROMETRY; LASER INDUCED FLUORESCENCE; METAL CHLORIDE REDUCTION CHEMICAL VAPOR DEPOSITION (CVD);

CHEMICAL VAPOR DEPOSITION;

CHEMICAL VAPOR DEPOSITION; COPPER COMPOUNDS; ETCHING; MASS SPECTROMETRY; MOLECULAR STRUCTURE; REACTION KINETICS; THIN FILMS;

EID: 31644439414     PISSN: 02578972     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.surfcoat.2005.07.010     Document Type: Article

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