Experimental and theoretical investigations of low-pressure CVD of Cu using CuI as precursor

Journal of Crystal Growth

Volumn 174, Issue 1-4, 1997, Pages 837-844

  Moller A ^a   Kall, R ^a   Till, V ^a   Wortberg, G ^a   Adomeit, G ^a  

^a RWTH AACHEN UNIVERSITY   (Germany)

Author keywords

[No Author keywords available]

Indexed keywords

BOUNDARY LAYERS; CHEMICAL VAPOR DEPOSITION; COMPUTATIONAL METHODS; COMPUTER SIMULATION; CRYSTAL IMPURITIES; ELECTRIC RESISTANCE; FLUORESCENCE; PRESSURE EFFECTS; SILICA; SPECTROSCOPIC ANALYSIS; SUBSTRATES;

COPPER IODINE; ENERGY DISPERSIVE X RAY (EDX) ANALYSIS; LASER INDUCED FLUORESCENCE SPECTROSCOPY;

COPPER COMPOUNDS;

EID: 0031547234     PISSN: 00220248     EISSN: None     Source Type: Journal    
DOI: 10.1016/S0022-0248(97)00044-4     Document Type: Article

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