Growth of strain-relaxed Ge films on Si(001) surfaces

Applied Physics Letters

Volumn 71, Issue 24, 1997, Pages 3510-3512

  Sakai, Akira ^a   Tatsumi, Toru ^a   Aoyama, Keiko ^a  

^a NEC CORPORATION   (Japan)

Author keywords

[No Author keywords available]

Indexed keywords

EID: 0000229168     PISSN: 00036951     EISSN: None     Source Type: Journal    
DOI: 10.1063/1.120375     Document Type: Article

References (22)

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