|
|
Volumn 18, Issue 7, 2004, Pages 795-806
|
|
Non-contact removal of 60-nm latex particles from silicon wafers with laser-induced plasma
a
a
|
|
Author keywords
Laser induced plasma (LIP); Micro manufacturing; Nano manufacturing; Nanoparticles; Particle removal; Polystyrene latex (PSL)
|
|
Indexed keywords
ADHESION;
MATHEMATICAL MODELS;
MICROELECTROMECHANICAL DEVICES;
NANOSTRUCTURED MATERIALS;
OPTICS;
POLYSTYRENES;
CHEMICAL CLEANING;
CONSERVATION;
LASER PRODUCED PLASMAS;
LATEXES;
MEMS;
NANOPARTICLES;
PARTICLE REMOVAL;
POLYSTYRENE LATEX (PSL);
SURFCE CLEANING;
THE JOHNSON, KENDALL AND ROBERTS (JKR) MODEL;
SILICON WAFERS;
CLEANING METHODS;
ENVIRONMENTAL CONSERVATION;
EQUIVALENT PARTICLE;
INTERNATIONAL TECHNOLOGY ROADMAP FOR SEMICONDUCTORS;
LASER INDUCED PLASMA;
LATEX PARTICLES;
MANUFACTURING PROCESS;
MICRO- AND NANO-PARTICLES;
NANO-MANUFACTURING;
NON-CONTACT;
NON-CONTACT TECHNIQUES;
POLYSTYRENE LATEXES;
PROCESS COSTS;
REMOVAL METHOD;
ROADMAP;
SCANNING MECHANISMS;
SUBSTRATE DAMAGE;
WORKPLACE SAFETY;
|
|
EID: 3142766832
PISSN: 01694243
EISSN: None
Source Type: Journal
DOI: 10.1163/156856104840327 Document Type: Article |
|
Times cited : (33)
|
|
References (11)
|
