Removal of small particles on silicon wafer by laser-induced airborne plasma shock waves

Journal of Applied Physics

Volumn 89, Issue 11 I, 2001, Pages 6496-6500

  Lee, J M ^a   Watkins, K G ^b  

^a Institute for Advanced Engineering (IAE)   (South Korea)

^b UNIVERSITY OF LIVERPOOL   (United Kingdom)

Author keywords

[No Author keywords available]

Indexed keywords

EID: 0035356129     PISSN: 00218979     EISSN: None     Source Type: Journal    
DOI: 10.1063/1.1353562     Document Type: Article

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