Nanoparticle removal from trenches and pinholes with pulsed-laser induced plasma and shock waves

Journal of Adhesion Science and Technology

Volumn 17, Issue 1, 2003, Pages 129-147

  Vanderwood, Richard ^a   Cetinkaya, Cetin ^a  

^a CLARKSON UNIVERSITY   (United States)

Author keywords

Laser cleaning; Laser ultrasonics; Micro contamination; Micro manufacturing; Nano manufacturing; Nanoparticles; Particle removal

Indexed keywords

CLEANING; LASER PRODUCED PLASMAS; LASER PULSES; SEMICONDUCTOR MATERIALS; SHOCK WAVES; SILICON WAFERS; WAVEFRONTS; ENVIRONMENTAL TECHNOLOGY; EXPERIMENTS; LASER BEAMS; MANUFACTURE; MICROMETERS; NANOPARTICLES; PULSED LASERS; SEMICONDUCTOR LASERS;

LASER CLEANING;

NANOSTRUCTURED MATERIALS; SUBSTRATES;

LASER CLEANING; LASER ULTRASONICS; MICRO-CONTAMINATION; MICRO-MANUFACTURING; NANO-MANUFACTURING; PARTICLE REMOVAL;

EID: 0037287311     PISSN: 01694243     EISSN: None     Source Type: Journal    
DOI: 10.1163/15685610360472484     Document Type: Article

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