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Volumn 17, Issue 6, 2003, Pages 763-776

Efficiency studies of particle removal with pulsed-laser induced plasma

Author keywords

Laser cleaning; Laser ultrasonics; Micro contamination; Micro manufacturing; Nano manufacturing; Particle removal

Indexed keywords

MICROELECTRONIC PROCESSING; NANOTECHNOLOGY; PLASMAS; PULSED LASER APPLICATIONS; SILICON WAFERS; SURFACE TREATMENT; ULTRASONIC APPLICATIONS; LASER PRODUCED PLASMAS; MANUFACTURE; MICROELECTRONICS; POLYSTYRENES; PULSED LASERS; SEMICONDUCTOR LASERS; SILICA;

EID: 0038141323     PISSN: 01694243     EISSN: None     Source Type: Journal    
DOI: 10.1163/156856103321645149     Document Type: Article
Times cited : (32)

References (12)
  • 1
    • 0038243687 scopus 로고    scopus 로고
    • International Technology Roadmap for Semiconductors
    • International Technology Roadmap for Semiconductors 2001, http://public.itrs.net/Files/2001ITRS/Home.htm
    • (2001)
  • 6
    • 0038058637 scopus 로고
    • A. H. Taub (Ed.); Pergamon, New York
    • A. H. Taub (Ed.), in: The Collected Works of John von Neuman, Vol. VI, pp. 219-237, Pergamon, New York (1963).
    • (1963) The Collected Works of John von Neuman , vol.6 , pp. 219-237
  • 11
    • 0038243686 scopus 로고    scopus 로고
    • MS Thesis, Clarkson University, Potsdam, NY
    • R. Vanderwood, MS Thesis, Clarkson University, Potsdam, NY (2002).
    • (2002)
    • Vanderwood, R.1


* 이 정보는 Elsevier사의 SCOPUS DB에서 KISTI가 분석하여 추출한 것입니다.