Site selective growth of Ge quantum dots on AFM-patterned Si substrates

Physica E: Low-Dimensional Systems and Nanostructures

Volumn 23, Issue 3-4 SPEC. ISS., 2004, Pages 248-252

  Hirai, A ^a   Itoh, K M ^a  

^a KEIO UNIVERSITY   (Japan)

Author keywords

Atomic force microscopy; Ge quantum dot; Nano lithography; Nano oxidation; Si

Indexed keywords

ANODIC OXIDATION; ATOMIC FORCE MICROSCOPY; GERMANIUM; LITHOGRAPHY; MOLECULAR BEAM EPITAXY; SILICON;

GE QUANTUM DOT; NANO OXIDATION; PATTERNED SUBSTRATES; PERIODIC ARRAYS;

SEMICONDUCTOR QUANTUM DOTS;

EID: 3142762318     PISSN: 13869477     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.physe.2003.12.130     Document Type: Conference Paper

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