Microstructure evolution of Al-Mg-B thin films by thermal annealing

Journal of Vacuum Science and Technology A: Vacuum, Surfaces and Films

Volumn 21, Issue 4, 2003, Pages 1055-1063

  Tian, Y ^a   Constant, A ^a   Lo, C C H ^b   Anderegg, J W ^b   Russell, A M ^a,b   Snyder, J E ^a,b   Molian, P ^a  

^a Iowa State University of Science and Technology   (United States)

^b IOWA STATE UNIVERSITY   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

ATOMIC FORCE MICROSCOPY; CRYSTAL MICROSTRUCTURE; CRYSTALLIZATION; INTERDIFFUSION (SOLIDS); POLYCRYSTALLINE MATERIALS; PULSED LASER DEPOSITION; RAPID THERMAL ANNEALING; SEMICONDUCTING ALUMINUM COMPOUNDS; SEMICONDUCTING SILICON; SILICA; X RAY DIFFRACTION ANALYSIS; X RAY PHOTOELECTRON SPECTROSCOPY;

ALUMINUM MAGNESIUM BORIDE; MICROSTRUCTURAL INSTABILITY; NANOSECOND PULSED LASER DEPOSITION; SURFACE CRACKING;

THIN FILMS;

EID: 0042030917     PISSN: 07342101     EISSN: None     Source Type: Journal    
DOI: 10.1116/1.1586274     Document Type: Article

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