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Materials Science Forum

Volumn 445-446, Issue , 2004, Pages 254-258

Porosity in silicon and silica thin films monitored by positrons and positronium

(7) Van Veen, A a Galindo, R Escobar a Eijt, S W H a Schut, H a Van Gog, H a Balkenende, A R b De Theije, F K b

a DELFT UNIVERSITY OF TECHNOLOGY (Netherlands)

b PHILIPS RESEARCH LABORATORIES (Netherlands)

Author keywords

Cavities; Helium; Hydrogen; Low k Dielectrics; Positron Annihilation; Silica; Silicon

Indexed keywords

DISSOCIATION; DOPPLER EFFECT; GAS CONDENSATES; HELIUM; ION IMPLANTATION; MATHEMATICAL MODELS; MECHANICAL PERMEABILITY; PORE SIZE; POROSITY; POSITRON ANNIHILATION SPECTROSCOPY; POSITRONS; THIN FILMS;

CAVITIES; HYDROGEN COVERAGE; LOW-K DIELECTRICS; POSITRON BEAM ANALYSIS;

SILICA;

EID: 3142738237 PISSN: 02555476 EISSN: 16629752 Source Type: Book Series
DOI: 10.4028/www.scientific.net/msf.445-446.254 Document Type: Conference Paper

Times cited : (2)

References (11)

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