Role of oxygen pressure during pulsed laser deposition on the electrical and dielectric properties of antiferroelectric lanthanum-doped lead zirconate stannate titanate thin films

Journal of Applied Physics

Volumn 96, Issue 1, 2004, Pages 569-574

  Yao, Yingbang ^a   Lu, S G ^a   Chen, Haydn ^a   Zhai, Jiwei ^b   Wong, K H ^c  

^a CITY UNIVERSITY OF HONG KONG   (Hong Kong)

^b TONGJI UNIVERSITY   (China)

^c HONG KONG POLYTECHNIC UNIVERSITY   (Hong Kong)

Author keywords

[No Author keywords available]

Indexed keywords

ANTIFERROELECTRIC MATERIALS; CAPACITORS; DOPING (ADDITIVES); LIGHT POLARIZATION; OPTIMIZATION; OXYGEN; PERMITTIVITY; PULSED LASER DEPOSITION; SURFACE ROUGHNESS; THIN FILMS;

DIELECTRIC STRENGTH; FATIGUE PERFORMANCE; OXYGEN PRESSURE; TETRAGONAL REGION;

LANTHANUM;

EID: 3142700720     PISSN: 00218979     EISSN: None     Source Type: Journal    
DOI: 10.1063/1.1758312     Document Type: Article

References (24)

1. W. Y. Pan, Q. Zhang, A. Bhalla, and L. E. Cross, J. Am. Ceram. Soc. 72, 571 (1989).
2. W. Y. Pan, C. Q. Dam, Q. M. Zhang, and L. E. Cross, J. Appl. Phys. 66, 6014 (1989).
3. B. Xu, L. E. Cross, and D. Ravichandran, J. Am. Ceram. Soc. 82, 306 (1999).
4. B. Xu, Y. Ye, Q.-M. Wang, and L. E. Cross, S. Appl. Phys. 85, 3753 (1999).
5. Z. Jiwei, M. H. Chung, Z. K. Xu, X. Li, and H. Chen, Appl. Phys. Lett. 81, 3621 (2002).
6. S. S. N. Bharadwaja and S. B. Krupanidhi, J. Appl. Phys. 86, 5862 (1999).
7. A. Gupta, J. Appl. Phys. 73, 7877 (1993).
8. T. Nakamura, Y. Yamanaka, A. Morimoto, and T. Shimizu, Jpn. J. Appl. Phys., Part 1.34, 5150 (1995).
9. X. S. Gao, J. M. Xue, J. Li, C. K. Ong, and J. Wang, Microelectron. Eng. 66, 926 (2003).
10. Y. Ding, J. Wu, Z. Meng, H. L. Chan, and Z. L. Choy, Mater. Chem. Phys. 75, 220 (2002).
11. W. Wu, K. H. Wong, C. L. Mak, C. L. Choy, and Y. H. Zhang, J. Appl. Phys. 88, 2068 (2000).
12. A. Masuda, K. Matsuda, Y. Yonezawa, A. Morimoto, and T. Shimizu, Jpn. J. Appl. Phys., Part 2 35, L237 (1996).
13. J. F. Scott and M. Dawber, Appl. Phys. Lett. 76, 3801 (2000).
14. J. Chen, A. Gorton, H. M. Chan, and M. P. Harmer, J. Am. Ceram. Soc. 69, C303 (1986).
15. D. B. Chrisey and G. K. Hubler, Pulsed Laser Deposition of Thin Films (Wiley, New York, 1994), p. 167.
16. R. K. Singh and J. Narayan, Phys. Rev. B 41, 8843 (1990).
17. V. Stankus, J. Dudonis, L. L. Pranevicius, D. Milcius, and C. Templier, Thin Solid Films 426, 78 (2003).
18. H.-J. Nam, D.-K. Choi, and W.-J. Lee, Thin Solid Films 371, 264 (2000).
19. S. S. Sengupta, D. Roberts, J.-F. Li, M. C. Kim, and D. A. Payne, J. Appl. Phys. 78, 1171 (1995).
20. M. J. Lefevre, J. S. Speck, R. W. Schwartz, D. Dimos, and S. J. Lockwood, J. Mater. Res. 11, 2076 (1996).
21. D. O'Neill, R. M. Bowman, and J. M. Gregg, Appl. Phys. Lett. 77, 1520 (2000).
22. N. A. Pertsev, V. G. Koukhar, R. Waser, and S. Hoffmann, Appl. Phys. Lett. 77, 2596 (2000).
23. Q. Y. Jiang, E. C. Subbarao, and L. E. Cross, J. Appl. Phys. 75, 7433 (1994).
24. J. H. Jang, K. H. Yoon, and H. J. Shin, Appl. Phys. Lett. 73, 1823 (1998).