Mechanism of stoichiometric deposition of volatile elements in multimetal-oxide films prepared by pulsed laser ablation

Japanese Journal of Applied Physics, Part 2: Letters

Volumn 35, Issue 2 B, 1996, Pages

  Masuda, Atsushi ^a   Matsuda, Kazuko ^a   Yonezawa, Yasuto ^a   Morimoto, Akiharu ^a   Shimizu, Tatsuo ^a  

^a KANAZAWA UNIVERSITY   (Japan)

Author keywords

[No Author keywords available]

Indexed keywords

BISMUTH; DEPOSITION; GARNETS; LASER ABLATION; LEAD COMPOUNDS; PULSED LASER APPLICATIONS; VAPOR PRESSURE; VAPORIZATION; VOLATILE ORGANIC COMPOUNDS;

BISMUTH IRON GARNET; LEAD ZIRCONATE TITANATE; PULSE DURATION; PULSED LASER ABLATION; PULSED LASER DEPOSITION; REPETITION FREQUENCY; WAVELENGTH;

METALLIC FILMS;

EID: 0030082482     PISSN: 00214922     EISSN: None     Source Type: Journal    
DOI: 10.1143/JJAP.35.L237     Document Type: Article

References (14)