Droplet-target laser-plasma source for proximity x-ray lithography

Applied Physics Letters

Volumn 68, Issue 19, 1996, Pages 2627-2629

  Malmqvist, L ^a   Rymell, L ^a   Hertz, H M ^a  

^a LUND INSTITUTE OF TECHNOLOGY   (Sweden)

Author keywords

[No Author keywords available]

Indexed keywords

COPOLYMERS; FLUORINE; FLUOROCARBONS; NOZZLES; PHOTONS; SILICON NITRIDE; THIN FILMS; X RAY LITHOGRAPHY; X RAY PHOTOELECTRON SPECTROSCOPY;

DROPLETS; LASER PLASMA X RAY SOURCE; METHACRYLIC ACID; PARTICULATE DEBRIS; THIN FILM FILTERS;

LASER PRODUCED PLASMAS;

EID: 0030572086     PISSN: 00036951     EISSN: None     Source Type: Journal    
DOI: 10.1063/1.116203     Document Type: Article

References (21)

1. A. Heuberger, J. Vac. Sci. Technol. B AIP 6, 107 (1988).
2. J. R. Maldonado, J. Electron. Mater. INS 19, 699 (1990).
3. H. I. Smith and M. L. Schattenburg, IBM J. Res. Dev. INS 37, 319 (1993).
4. J. R. Maldonado, in Applications of Laser Plasma Radiation II, edited by M. C. Richardson and G. A. Kyrala [Proc. SPIE 2523, 2 (1995)].
5. R. J. Rosser, R. Feder, A. Ng, F. Adams, P. Celliers, and R. J. Speer, Appl. Opt. AIP 26, 4313 (1987).
6. F. Bijkerk, E. Louis, M. J. van der Wiel, E. C. I. Turcu, G. J. Tallents, and D. Batani, J. X-Ray Sci. Technol. 3, 133 (1992).
7. M. Kühne and H.-C. Petzold, Appl. Opt. AIP 27, 3926 (1988).
8. R. Kodama, K. Okada, N. Ikeda, M. Mineo, K. A. Tanaka, T. Mochizuki, and C. Yamanaka, J. Appl. Phys. AIP 59, 3050 (1986).
9. K. Gabel, M. Richardsson, M. Kado, and A. Vassiliev, Opt. Lett. AIP 19, 2047 (1994).
10. S. J. Haney, K. W. Berger, G. L. Kubiak, P. D. Rockett, and J. Hunter, Appl. Opt. AIP 32, 6934 (1993).
11. W. T. Silfvast, M. C. Richardsson, H. Bender, A. Hanzo, V. Yanovsky, F. Jin, and J. Thorpe, J. Vac. Sci. Technol. B AIP 10, 3126 (1992).
12. L. Rymell and H. M. Hertz, Opt. Commun. INS 103, 105 (1993).
13. L. Rymell and H. M. Hertz, Rev. Sci. Instrum. AIP 66, 4916 (1995).
14. H. M. Hertz, L. Rymell, M. Berglund, and L. Malmqvist, in Applications of Laser Plasma Radiation II, edited by M. C. Richardson and G.A. Kyrala [Proc. SPIE 2523, 88 (1995)].
15. L. Rymell, M. Berglund, and H. M. Hertz, Appl. Phys. Lett. AIP 66, 2625 (1995).
16. H. Fiedorowicz, A. Bartnik, and Z. Patron, Appl. Phys. Lett. AIP 62, 2778 (1993).
17. R. P. Haelbich, J. P. Silverman, and J. M. Warlaumont, Nucl. Instrum. Methods 222, 291 (1984).
18. B. L. Henke, P. Lee, T. J. Tanaka, R. L. Shimabukuro, and B. K. Fujikawa, At. Data Nucl. Data Tables INS 27, 1 (1982).
19. G. D. Kubiak, R. Q. Hwang, M. T. Schulberg, D. A. Tichenor, and K. Early, Appl. Opt. AIP 32, 7036 (1993).
20. M. Schuster and H. Göbel, Appl. Phys. INS 28, A275 (1995).
21. N. M. Ceglio and A. M. Hawryluk, J. X-Ray Sci. Technol. 3, 194 (1992).