Mask technology of extreme ultraviolet lithography

Proceedings of SPIE - The International Society for Optical Engineering

Volumn 3412, Issue , 1998, Pages 358-368

  Kinoshita, H ^a   Watanabe, T ^a   Ozawa, A ^b   Niibe, M ^a  

^a UNIVERSITY OF HYOGO   (Japan)

^b NTT Advanced Technology Corporation   (Japan)

Author keywords

EUVL; Inspection; Mask; Multilayer; Repair

Indexed keywords

INSPECTION; LIGHT ABSORPTION; LIGHT REFLECTION; MASKS; MIRRORS; MULTILAYERS; SUBSTRATES; ULTRAVIOLET RADIATION;

COATING EQUIPMENT; EXTREME ULTRAVIOLET LITHOGRAPHY; MULTILAYER MIRROR;

PHOTOLITHOGRAPHY;

EID: 0006696471     PISSN: 0277786X     EISSN: None     Source Type: Conference Proceeding    
DOI: 10.1117/12.328848     Document Type: Conference Paper

References (11)

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