Performance of Cr mask for extreme ultraviolet lithography

Proceedings of SPIE - The International Society for Optical Engineering

Volumn 4409, Issue , 2001, Pages 681-686

  Nii, H ^a   Kinoshita, H ^a   Watanabe, T ^a   Hamamoto, K ^a   Tsubakino, H ^a   Sugie, Y ^a  

^a UNIVERSITY OF HYOGO   (Japan)

Author keywords

Cr absorber; EUV mask; EUVL

Indexed keywords

COATINGS; GLASS; LITHOGRAPHY; MULTILAYERS; SYNCHROTRON RADIATION;

EXTREME ULTRAVIOLET LITHOGRAPHY; PHOTOMASK;

MASKS;

EID: 0035192058     PISSN: 0277786X     EISSN: None     Source Type: Conference Proceeding    
DOI: 10.1117/12.438367     Document Type: Conference Paper

References (5)

1. Soft x-ray reduction lithography using multilayer mirrors
2. Three-aspherical mirror system for EUV lithography
3. Mask technology of extreme ultraviolet lithography
4. Contrast measurement of reflection mask for Cr and Ta absorber for EUVL
5. Development of the large field camera