Studies on EUV mask cleaning by dry and wet processes

Proceedings of SPIE - The International Society for Optical Engineering

Volumn 4409, Issue , 2001, Pages 687-694

  Nii, H ^a   Kinoshita, H ^a   Watanabe, T ^a   Matsuo, Y ^a   Sugie, Y ^a  

^a UNIVERSITY OF HYOGO   (Japan)

Author keywords

Cleaning; Multilayer; Piranha; RCA; X ray diffractometer

Indexed keywords

CLEANING; MASKS; MULTILAYERS; OZONE; PHOTORESISTS; SURFACE ROUGHNESS; X RAY DIFFRACTION ANALYSIS;

DRY ASHING; EXTREME ULTRAVIOLET LITHOGRAPHY; PIRANHA;

LITHOGRAPHY;

EID: 0035179708     PISSN: 0277786X     EISSN: None     Source Type: Conference Proceeding    
DOI: 10.1117/12.438368     Document Type: Conference Paper

References (2)