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Journal of Vacuum Science and Technology A: Vacuum, Surfaces and Films

Volumn 22, Issue 3, 2004, Pages 477-481

Ionized magnetron sputter deposition of hard nanocomposite TiN/amorphous-silicon nitride films

(3) Phinichka, N a,b Chandra, R a,c Barber, Z H a

a UNIVERSITY OF CAMBRIDGE (United Kingdom)

b SRINAKHARINWIROT UNIVERSITY (Thailand)

c CH CHARAN SINGH UNIVERSITY (India)

Author keywords

[No Author keywords available]

Indexed keywords

CRYSTALLOGRAPHY; DISLOCATIONS (CRYSTALS); ELASTIC MODULI; FILM GROWTH; GRAIN SIZE AND SHAPE; HARDNESS; MAGNETRON SPUTTERING; NANOSTRUCTURED MATERIALS; PHYSICAL VAPOR DEPOSITION; PLASMA ENHANCED CHEMICAL VAPOR DEPOSITION; PLASMAS; SPUTTER DEPOSITION; STOICHIOMETRY; TITANIUM ALLOYS;

CHEMICAL STABILITY; ION FLUXES; NANOINDENTATION; OPERATIONAL PARAMETERS;

THIN FILMS;

EID: 3142518030 PISSN: 07342101 EISSN: None Source Type: Journal
DOI: 10.1116/1.1690778 Document Type: Article

Times cited : (13)

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