Plasma-induced deposition of titanium nitride from TiCl4 in a direct current glow discharge: Control of the chlorine content and gas-phase nucleation

Plasma Chemistry and Plasma Processing

Volumn 16, Issue 3, 1996, Pages 341-363

  Patscheider, Jörg ^a   Shizhi, Li ^b   Vepřek, Stan ^c  

^a SWISS FEDERAL LABORATORIES FOR MATERIALS SCIENCE AND TECHNOLOGY   (Switzerland)

^b QINGDAO UNIVERSITY OF SCIENCE AND TECHNOLOGY   (China)

^c TECHNICAL UNIVERSITY OF MUNICH   (Germany)

Author keywords

Diffusion barriers; Glow discharge plasma CVD; TiCl4 wear protective coatings; Titanium nitride

Indexed keywords

EID: 5544288538     PISSN: 02724324     EISSN: None     Source Type: Journal    
DOI: 10.1007/BF01447150     Document Type: Article

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